熔融石英中辐射诱导的密度和吸收变化

Bragg Gratings, Photosensitivity, and Poling in Glass Fibers and Waveguides: Applications and Fundamentals Pub Date : 1900-01-01 DOI:10.1364/bgppf.1997.jma.1

T. Seward, C. Smith, N. Borrelli, D. Allan, R. Araujo

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摘要

熔融石英的一个主要增长应用是利用248 nm (KrF)和193 nm (ArF)波长的深紫外准分子激光辐射作为集成电路制造的微光刻透镜。这种短波长的辐射，虽然允许更高的图像分辨率，可能会导致玻璃的结构变化，这可能会对镜头的性能产生不利影响。这些变化表现为色心和玻璃化。

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Radiation-induced density and absorption changes in fused silica

A major growing application for fused silica is as microlithography lenses for integrated circuit manufacture using deep ultraviolet excimer laser radiation at 248 nm (KrF) and 193 nm (ArF) wavelengths. Such short wavelength radiation, while allowing higher image resolution, can cause structural changes in the glass which can adversely affect lens performance. These changes are manifest as color centers and glass densification.

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Bragg Gratings, Photosensitivity, and Poling in Glass Fibers and Waveguides: Applications and Fundamentals

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