双电子波导器件中的一维到一维隧穿

C. Eugster, J. D. del Alamo, M. Melloch, M. Rooks
{"title":"双电子波导器件中的一维到一维隧穿","authors":"C. Eugster, J. D. del Alamo, M. Melloch, M. Rooks","doi":"10.1109/DRC.1993.1009613","DOIUrl":null,"url":null,"abstract":"Summary form only given. The authors report the first unambiguous observation of controlled electron tunneling between two closely spaced 1D electron waveguides. This represents a significant step toward the realization of a quantum field-effect electron directional coupler (QFED). The authors have fabricated a variety of dual electron waveguide devices with different lengths and widths on an AlGaAs/GaAs heterostructure (N/sub s/=4*0/sup 11/ cm/sup -2/ and mu =1.2*10/sup 6/ cm/sup 2//V-s at 4 K). The key feature in these devices is the 30-nm-wide middle gate fabricated using a single-pass e-beam lithography technique. Such a thin gate is required to achieve significant tunneling. A 1D to 1D regime is established when two electron waveguides are implemented. The tunneling current should be sensitive to the alignment of the subbands in the two electron waveguides. In this regime, bumps in the tunneling current are observed as a function of both side-gate voltages as the individual subbands line up between the two waveguides. This is unmistakable proof that 1D to 1D tunneling is taking place. >","PeriodicalId":310841,"journal":{"name":"51st Annual Device Research Conference","volume":"9 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1993-06-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"1D to 1D tunneling in a dual electron waveguide device\",\"authors\":\"C. Eugster, J. D. del Alamo, M. Melloch, M. Rooks\",\"doi\":\"10.1109/DRC.1993.1009613\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Summary form only given. The authors report the first unambiguous observation of controlled electron tunneling between two closely spaced 1D electron waveguides. This represents a significant step toward the realization of a quantum field-effect electron directional coupler (QFED). The authors have fabricated a variety of dual electron waveguide devices with different lengths and widths on an AlGaAs/GaAs heterostructure (N/sub s/=4*0/sup 11/ cm/sup -2/ and mu =1.2*10/sup 6/ cm/sup 2//V-s at 4 K). The key feature in these devices is the 30-nm-wide middle gate fabricated using a single-pass e-beam lithography technique. Such a thin gate is required to achieve significant tunneling. A 1D to 1D regime is established when two electron waveguides are implemented. The tunneling current should be sensitive to the alignment of the subbands in the two electron waveguides. In this regime, bumps in the tunneling current are observed as a function of both side-gate voltages as the individual subbands line up between the two waveguides. This is unmistakable proof that 1D to 1D tunneling is taking place. >\",\"PeriodicalId\":310841,\"journal\":{\"name\":\"51st Annual Device Research Conference\",\"volume\":\"9 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1993-06-21\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"51st Annual Device Research Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/DRC.1993.1009613\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"51st Annual Device Research Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DRC.1993.1009613","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

只提供摘要形式。作者报告了两个紧密间隔的一维电子波导之间的受控电子隧穿的首次明确观察。这是实现量子场效应电子定向耦合器(QFED)的重要一步。作者在AlGaAs/GaAs异质结构(N/sub /=4*0/sup 11/ cm/sup -2/和mu =1.2*10/sup 6/ cm/sup 2//V-s)上制作了多种不同长度和宽度的双电子波导器件,这些器件的主要特点是采用单通电子束光刻技术制作了30 nm宽的中间栅极。这样薄的闸门需要实现显著的隧道掘进。当实现两个电子波导时,建立了一维到一维的状态。隧穿电流应对两个电子波导中子带的排列敏感。在这种情况下,当单个子带在两个波导之间排列时,隧道电流中的颠簸被观察到作为两个侧门电压的函数。这是一维到一维隧道正在发生的确凿证据。>
本文章由计算机程序翻译,如有差异,请以英文原文为准。
1D to 1D tunneling in a dual electron waveguide device
Summary form only given. The authors report the first unambiguous observation of controlled electron tunneling between two closely spaced 1D electron waveguides. This represents a significant step toward the realization of a quantum field-effect electron directional coupler (QFED). The authors have fabricated a variety of dual electron waveguide devices with different lengths and widths on an AlGaAs/GaAs heterostructure (N/sub s/=4*0/sup 11/ cm/sup -2/ and mu =1.2*10/sup 6/ cm/sup 2//V-s at 4 K). The key feature in these devices is the 30-nm-wide middle gate fabricated using a single-pass e-beam lithography technique. Such a thin gate is required to achieve significant tunneling. A 1D to 1D regime is established when two electron waveguides are implemented. The tunneling current should be sensitive to the alignment of the subbands in the two electron waveguides. In this regime, bumps in the tunneling current are observed as a function of both side-gate voltages as the individual subbands line up between the two waveguides. This is unmistakable proof that 1D to 1D tunneling is taking place. >
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信