A. Fathimulla, H. Hier, D. Gutierrez
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引用次数: 0

摘要

人们对用于高速互补数字放大器和推挽放大器的基于inp的hbt越来越感兴趣。对基于InP的HBTs的大部分研究都集中在InP/GaInAs和AlInAdGaInAs系统上。我们报道了与InP衬底匹配的AlInAs/GaAsSb/AlInAs npn HBTs和AlGaAsSb/GaInAs/GaInAs pnp HBTs晶格的生长和性能。在这些结构中,所有带隙差都在AIInAdGaAsSb的价带(0.65 eV)和AIGaAsSb/GaInAs的导带(1.1 eV)结中,导致高性能npn (pnp) HBTs所需的大AEv (AE,)和小AE (AE,)。我们首次展示了AlGaAsSb/GaInAs/GaInAs pnp HBT,并在npn和pnp HBT中获得了优异的微波性能。利用Sb和As的助熔剂,用MBE法生长HBT结构。npn HBT的外延结构包括一个500 nm的n'-GaInAs子集电极、一个300 nm的n- alinas集电极、一个60 nm的p'-GaAsSb基、一个2 nm的InP蚀刻停止、一个100 nm的n- alinas发射极和一个n'-GaInAs子集电极。pnp HBT的结构由一个400 nm的p'=-GaInAs子集电极、一个400 nm的p -GaInAs集电极、一个60 nm的n'-GaInAs、70 nm的p- a1,Ga,As,Sb 44发射极和一个350 nm的p'=-GaInAs子集电极组成。在2e19浓度下,GaAsSb的空穴迁移率是GaInAs的两倍。这种更高的迁移率将降低基电阻,并提高GaAsSb基器件与GaInAs基的传统hbt器件的性能。自对准HBTs的加工细节见文献1。对于5x5 pm尺寸的npn器件,测量到集电极电流密度为6x104 A/cm2, h为25。我们测量了npn HBT的BV…约为1OV。对于pnp HBT, BV,,,,为12 V, h为10,集电极电流密度为2x104 a /cm2。利用级联片上探针测量了共发射极结构下的高频性能。外推的f和f…分别为45 GHz和34 GHz,用于5x5 pm尺寸的双异质结npn HBT。测量了4x6 pm pnp HBT的14 GHz频率。这些实验结果表明,与InP衬底匹配的基于sb的npn和pnp HBTs晶格是互补应用的绝佳选择。参考:
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Performance of the AlGaAsSb/GaInAs/GaInAs PNP and AlInAs/GaAsSb/AlInAs NPN HBTs
Interest is growing in the InP-based HBTs for high-speed complementary digital and push-pull amplifier applications. The majority of the research done on the InP-based HBTs has been concentrated on the InP/GaInAs and AlInAdGaInAs systems. In these devices, the emitter-tobase junction is generally graded to minimize the effect of large conduction band spike We report the growth and performance of AlInAs/GaAsSb/AlInAs npn HBTs and AlGaAsSb/GaInAs/GaInAs pnp HBTs lattice matched to InP substrates. In these structures all of the band-gap difference is in the valence band for AIInAdGaAsSb (0.65 eV) and conduction band for AIGaAsSb/GaInAs (1.1 eV) junctions, resulting in the large AEv (AE,) and small AE, (AE,) desirable for high performance npn (pnp) HBTs. For the first time, we have demonstrated a AlGaAsSb/GaInAs/GaInAs pnp HBT and obtained excellent microwave performance for both npn and pnp HBTs. ' The HBT structures were grown by MBE using fluxes of Sb, and As,. The epitaxial structure for the npn HBT consisted of a 500 nm n'-GaInAs subcollector, a 300 nm n-AlInAs collector, a 60 nm p'-GaAsSb base, a 2 nm InP etch stop, a 100 nm n-AlInAs emitter and followed by n'-GaInAs subcollector. The structure for the pnp HBT consisted of a 400 nm p'-GaInAs subcollector, a 400 nm P-GaInAs collector, a 60 nm n'-GaInAs, 70 nm p-A1 ,Ga,As ,,Sb 44 emitter and a 350 nm p'=-GaInAs subemitter. The GaAsSb hole mobility at a concentration of 2e19 was twice the hole mobility of GaInAs. This higher mobility will lower the base resistance and improve the performance of the GaAsSb base devices over conventional HBTs with GaInAs bases. Details of the processing of self-aligned HBTs were published in reference 1. A collector current density of 6x104 A/cm2 and an h,of 25 were measured for a 5x5 pm size npn device. We measured a BV,,, of about 1OV for the npn HBT. For the pnp HBT, a BV,,,, of 12 V, an h, of 10, and a collector current density of 2x104 A/cm2 were obtained. The high frequency performance of the HBTs in the common emitter configuration was measured with a Cascade on-wafer probe. The extrapolated f, and f,,, were 45 GHz and 34 GHz for a 5x5 pm size double heterojunction npn HBT. An f,,, of 14 GHz for a 4x6 pm pnp HBT was measured. These experimental results indicate that Sb-based npn and pnp HBTs latticematched to InP substrate are an excellent choice for complementary applications. Reference:
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