氮化硼衬底上石墨烯场效应晶体管的输运行为

Alfonso Alarcón, V. Nguyen, S. Berrada, Damien Querlioz, J. Saint-Martin, A. Bournel, P. Dollfus
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引用次数: 2

摘要

我们模拟了氮化硼作为衬底和栅极绝缘体材料的顶门控石墨烯场效应晶体管的输运行为。我们的模拟模型基于非平衡格林函数方法来求解石墨烯的紧密结合哈密顿量,自洽地与泊松方程耦合。分析强调了石墨烯中载流子的手性特性在不同输运机制下的影响,包括克莱因和带对带隧道过程。我们预测了负差分电导的可能出现,并研究了其对温度和bn诱导带隙的依赖。通过分析作为栅极长度和栅极绝缘子厚度函数的传递特性来评价短通道效应。它们表现为狄拉克点的位移和短栅极长度处电流振荡的出现。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Transport behaviors in graphene field effect transistors on boron nitride substrate
We model the transport behavior of a top-gated graphene field-effect transistor where boron nitride is used as substrate and gate insulator material. Our simulation model is based on the non-equilibrium Green's function approach to solving a tight-binding Hamiltonian for graphene, self-consistently coupled with Poisson's equation. The analysis emphasizes the effects of the chiral character of carriers in graphene in the different transport regimes including Klein and band-to-band tunneling processes. We predict the possible emergence of negative differential conductance and investigate its dependence on the temperature and the BN-induced bandgap. Short-channel effects are evaluated from the analysis of transfer characteristics as a function of gate length and gate insulator thickness. They manifest through the shift of the Dirac point and the appearance of current oscillations at short gate length.
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