恒流应力下掺be的AlGaAs/GaAs HBTs的直流和射频降解研究

M. Borgarino, R. Menozzi, J. Tasselli, A. Marty, F. Fantini
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引用次数: 8

摘要

AlGaAs/GaAs hbt在无线产品市场中发挥着越来越重要的作用。虽然Be和C孰优孰劣仍是科学争论的问题,但Be掺杂的技术更成熟,在商业上比C掺杂更重要。然而,众所周知,Be向发射极的外扩散(一种由高电流密度加速的降解机制)会产生p-n基极-发射极结的位移,从而导致其导通电压(V/sub BEon/)的增加和电流增益(spl beta/)的降低。较少讨论Be扩散对器件RF特性的影响,以及它们与直流退化模式的相关性。此外,应力时间和电流依赖性的退化并没有结论性的文件。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A study of the DC and RF degradation of Be-doped AlGaAs/GaAs HBTs under constant current stress
AlGaAs/GaAs HBTs play an increasingly important role in the market of wireless products. Although it is still a matter of scientific debate whether Be or C is the optimum base dopant, the technology of Be-doping is more mature, and commercially more important than that of C-doping. However, it is well known that the outdiffusion of Be toward the emitter (a degradation mechanism that is accelerated by high current densities) produces a displacement of the p-n base-emitter junction which results in an increase of its turn-on voltage (V/sub BEon/) and a reduction of the current gain /spl beta/. Less treated are the effects of Be diffusion on the device RF characteristics, and their correlation with the DC degradation mode. Moreover, the stress time and current dependences of the degradation are not conclusively documented.
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