Richard L. Donze, J. Sanders, M. Jenkins, G. Sporzynski
{"title":"一个VLSI设计系统","authors":"Richard L. Donze, J. Sanders, M. Jenkins, G. Sporzynski","doi":"10.1145/800263.809202","DOIUrl":null,"url":null,"abstract":"This paper describes a design system capable of designing chips in the range of 5K to 7K equivalent three-way NOR gates. A key feature of the system is the ability to design chips with large macros (RAMs and PLAs). This design system is part of IBM's corporate-wide Engineering Design System (EDS). EDS provides the capabilities of logic simulation, automatic placement and wiring, checking, and test pattern generation [1]. This paper describes the key capabilities of the system, specifically as applied to IBM's silicon gate process. Topics covered include a description of the chip image and circuits, the automatic generation of large macros, the automatic placement and interconnection of circuits and macros, and a delay calculator/optimizer.","PeriodicalId":290739,"journal":{"name":"19th Design Automation Conference","volume":"5 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"7","resultStr":"{\"title\":\"PHILO - A VLSI Design System\",\"authors\":\"Richard L. Donze, J. Sanders, M. Jenkins, G. Sporzynski\",\"doi\":\"10.1145/800263.809202\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper describes a design system capable of designing chips in the range of 5K to 7K equivalent three-way NOR gates. A key feature of the system is the ability to design chips with large macros (RAMs and PLAs). This design system is part of IBM's corporate-wide Engineering Design System (EDS). EDS provides the capabilities of logic simulation, automatic placement and wiring, checking, and test pattern generation [1]. This paper describes the key capabilities of the system, specifically as applied to IBM's silicon gate process. Topics covered include a description of the chip image and circuits, the automatic generation of large macros, the automatic placement and interconnection of circuits and macros, and a delay calculator/optimizer.\",\"PeriodicalId\":290739,\"journal\":{\"name\":\"19th Design Automation Conference\",\"volume\":\"5 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"7\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"19th Design Automation Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1145/800263.809202\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"19th Design Automation Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1145/800263.809202","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
This paper describes a design system capable of designing chips in the range of 5K to 7K equivalent three-way NOR gates. A key feature of the system is the ability to design chips with large macros (RAMs and PLAs). This design system is part of IBM's corporate-wide Engineering Design System (EDS). EDS provides the capabilities of logic simulation, automatic placement and wiring, checking, and test pattern generation [1]. This paper describes the key capabilities of the system, specifically as applied to IBM's silicon gate process. Topics covered include a description of the chip image and circuits, the automatic generation of large macros, the automatic placement and interconnection of circuits and macros, and a delay calculator/optimizer.