生长温度和V/III比对au辅助InxGa1−xAs纳米线的影响

A. Ameruddin, H. Tan, H. Fonseka, Q. Gao, J. Wong-Leung, P. Parkinson, S. Breuer, C. Jagadish
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引用次数: 0

摘要

采用金属有机化学气相沉积法(MOCVD)在不同生长温度和V/III比下生长InxGa1-xAs纳米线。研究了这些生长参数对纳米线形貌和纳米线上成分分布的影响。随着生长温度的升高和V/III比的降低,纳米线的锥度减小。然而,随着V/III比的降低,Ga在纳米线中的掺入也减少了。沿纳米线的成分分布不均匀,典型的是富in基和富ga尖端。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Influence of growth temperature and V/III ratio on Au-assisted InxGa1−xAs nanowires
InxGa1-xAs nanowires were grown using metal-organic chemical vapour deposition (MOCVD) with various growth temperatures and V/III ratios. The morphology of these nanowires and the composition distribution along the nanowire were studied as a function of these growth parameters. With higher growth temperature and lower V/III ratio, the tapering of the nanowires is reduced. However, the incorporation of Ga in the nanowires is also reduced with lower V/III ratio. The composition distribution along the nanowires is non-uniform with typically In-rich bases and Ga-rich tips.
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