用XPS分析NEA光电阴极GaAs(100)表面

IVESC 2004. The 5th International Vacuum Electron Sources Conference Proceedings (IEEE Cat. No.04EX839) Pub Date : 2004-09-06 DOI:10.1109/IVESC.2004.1414180

R. Fua, B. Chang, P. Gao

{"title":"用XPS分析NEA光电阴极GaAs(100)表面","authors":"R. Fua, B. Chang, P. Gao","doi":"10.1109/IVESC.2004.1414180","DOIUrl":null,"url":null,"abstract":"This paper first introduces the characteristic of GaAs for the manufacture of evaluation system of negative electron affinity photocathode. Then the paper gives the surface clean technique of the GaAs. The spectral diagrams of the elements on the surface of the GaAs before and after the surface clean process are given. Through the comparing of the spectral diagrams a conclusion is obtained that the cleaning technique can eliminate the oxides on the surface of the GaAs. At last, the paper gives the spectral response curve of the NEA photocathode.","PeriodicalId":340787,"journal":{"name":"IVESC 2004. The 5th International Vacuum Electron Sources Conference Proceedings (IEEE Cat. No.04EX839)","volume":"6 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2004-09-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"44","resultStr":"{\"title\":\"The analysis of the (100)surface of GaAs for NEA photocathode with XPS\",\"authors\":\"R. Fua, B. Chang, P. Gao\",\"doi\":\"10.1109/IVESC.2004.1414180\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper first introduces the characteristic of GaAs for the manufacture of evaluation system of negative electron affinity photocathode. Then the paper gives the surface clean technique of the GaAs. The spectral diagrams of the elements on the surface of the GaAs before and after the surface clean process are given. Through the comparing of the spectral diagrams a conclusion is obtained that the cleaning technique can eliminate the oxides on the surface of the GaAs. At last, the paper gives the spectral response curve of the NEA photocathode.\",\"PeriodicalId\":340787,\"journal\":{\"name\":\"IVESC 2004. The 5th International Vacuum Electron Sources Conference Proceedings (IEEE Cat. No.04EX839)\",\"volume\":\"6 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2004-09-06\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"44\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IVESC 2004. The 5th International Vacuum Electron Sources Conference Proceedings (IEEE Cat. No.04EX839)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IVESC.2004.1414180\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IVESC 2004. The 5th International Vacuum Electron Sources Conference Proceedings (IEEE Cat. No.04EX839)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IVESC.2004.1414180","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 44

摘要

本文首先介绍了用于制造负电子亲和光电阴极评价系统的砷化镓材料的特点。然后给出了砷化镓的表面清洁技术。给出了表面净化前后砷化镓表面元素的光谱图。通过对光谱图的比较，得出清洗技术可以消除砷化镓表面的氧化物的结论。最后给出了NEA光电阴极的光谱响应曲线。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文本刊更多论文

The analysis of the (100)surface of GaAs for NEA photocathode with XPS

This paper first introduces the characteristic of GaAs for the manufacture of evaluation system of negative electron affinity photocathode. Then the paper gives the surface clean technique of the GaAs. The spectral diagrams of the elements on the surface of the GaAs before and after the surface clean process are given. Through the comparing of the spectral diagrams a conclusion is obtained that the cleaning technique can eliminate the oxides on the surface of the GaAs. At last, the paper gives the spectral response curve of the NEA photocathode.

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

IVESC 2004. The 5th International Vacuum Electron Sources Conference Proceedings (IEEE Cat. No.04EX839)

自引率

0.00%

发文量