{"title":"大气条件下硅表面水分吸附的光热探针束偏转测量","authors":"Holger Schroeder, A. Tam","doi":"10.1364/lmd.1987.tha3","DOIUrl":null,"url":null,"abstract":"Although there is much work done on thermal desorption of molecules on a solid surface /1/, most previous work was performed in vacuum or low-pressure conditions and utilized direct particle detectors (e.g. mass spectrometer). The present work examines photo-thermal desorption from a surface in atmospheric conditions utilizing a probe-beam deflection /2/ technique. This is demonstrated for an important case of adsorbed water on a silicon wafer with normal surface oxide.","PeriodicalId":331014,"journal":{"name":"Topical Meeting on Lasers in Materials Diagnostics","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Photothermal Probe-Beam Deflection Measurement of Moisture Adsorption on a Silicon Surface Under Atmospheric Conditions\",\"authors\":\"Holger Schroeder, A. Tam\",\"doi\":\"10.1364/lmd.1987.tha3\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Although there is much work done on thermal desorption of molecules on a solid surface /1/, most previous work was performed in vacuum or low-pressure conditions and utilized direct particle detectors (e.g. mass spectrometer). The present work examines photo-thermal desorption from a surface in atmospheric conditions utilizing a probe-beam deflection /2/ technique. This is demonstrated for an important case of adsorbed water on a silicon wafer with normal surface oxide.\",\"PeriodicalId\":331014,\"journal\":{\"name\":\"Topical Meeting on Lasers in Materials Diagnostics\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Topical Meeting on Lasers in Materials Diagnostics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1364/lmd.1987.tha3\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Topical Meeting on Lasers in Materials Diagnostics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/lmd.1987.tha3","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Photothermal Probe-Beam Deflection Measurement of Moisture Adsorption on a Silicon Surface Under Atmospheric Conditions
Although there is much work done on thermal desorption of molecules on a solid surface /1/, most previous work was performed in vacuum or low-pressure conditions and utilized direct particle detectors (e.g. mass spectrometer). The present work examines photo-thermal desorption from a surface in atmospheric conditions utilizing a probe-beam deflection /2/ technique. This is demonstrated for an important case of adsorbed water on a silicon wafer with normal surface oxide.