{"title":"负载变化对晶圆上集总元件校准的影响","authors":"P. Kirby, L. Dunleavy, T. Weller","doi":"10.1109/ARFTG.1999.327368","DOIUrl":null,"url":null,"abstract":"We present a study of DC and RF measured variations in the resistance of loads that are to be used for on-wafer calibrations on GaAs substrates. The impact on measurement-based calibration definitions, and the calibration errors arising from neglecting the variations will be explored. Promising solutions for accommodating the variations into accurate on-wafer calibration strategies are advanced based on the use of the dc resistance of the load standard to aid in the calibration standard definition process.","PeriodicalId":284470,"journal":{"name":"54th ARFTG Conference Digest","volume":"50 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"8","resultStr":"{\"title\":\"The effect of load variations on on-wafer lumped element based calibrations\",\"authors\":\"P. Kirby, L. Dunleavy, T. Weller\",\"doi\":\"10.1109/ARFTG.1999.327368\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We present a study of DC and RF measured variations in the resistance of loads that are to be used for on-wafer calibrations on GaAs substrates. The impact on measurement-based calibration definitions, and the calibration errors arising from neglecting the variations will be explored. Promising solutions for accommodating the variations into accurate on-wafer calibration strategies are advanced based on the use of the dc resistance of the load standard to aid in the calibration standard definition process.\",\"PeriodicalId\":284470,\"journal\":{\"name\":\"54th ARFTG Conference Digest\",\"volume\":\"50 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2000-12-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"8\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"54th ARFTG Conference Digest\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ARFTG.1999.327368\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"54th ARFTG Conference Digest","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ARFTG.1999.327368","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
The effect of load variations on on-wafer lumped element based calibrations
We present a study of DC and RF measured variations in the resistance of loads that are to be used for on-wafer calibrations on GaAs substrates. The impact on measurement-based calibration definitions, and the calibration errors arising from neglecting the variations will be explored. Promising solutions for accommodating the variations into accurate on-wafer calibration strategies are advanced based on the use of the dc resistance of the load standard to aid in the calibration standard definition process.
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