高散热VLSI非接触式温度设定系统

D.S. Kostyuchenko, D. Bobrovskiy, A. Pechenkin, V. Marfin, A. Tsirkov, A. Karakozov
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引用次数: 0

摘要

为进行高发热量超大规模集成电路的辐射研究,需要开发一种非接触式冷却系统。在开发过程中,考虑并测试了各种可用的冷却产品的方法:浸入式冷却和冷箱-这些方法都没有带来预期的结果。因此,基于高压压缩空气吹制VLSI晶体的过程,组装了冷却系统。该系统以空气压缩机为基础。压缩机配有外部传感器来控制样品的温度,并配有输出气流的控制系统。整个样品温度的设定过程由个人电脑自动控制。本文介绍了该解决方案的软硬件部分。这种非接触式冷却系统在实际的超大规模集成电路辐射研究中得到了很好的应用。然而,在未来,它计划改善一些参数,以发展这种冷却系统,以提高其效率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Non-Contact Temperature Setting System for VLSI with High Heat Dissipation
It was required to develop a non-contact cooling system for conducting radiation research of VLSI with high heat generation. During the development process, various available methods for cooling products were considered and tested: immersion cooling and a cold-box – these methods did not bring the desired result.As a result, a cooling system was assembled based on the process of blowing the VLSI crystal with high-pressure compressed air. The system was based on an air compressor. The compressor was supplemented with external sensors to control the temperature of the samples and a control system for the output air flow. The entire process of setting the sample temperature was automatically controlled from a personal computer. The software and hardware parts of the solution are presented in this article.This non-contact cooling system has shown itself well in the conditions of real VLSI radiation research at physical facilities. However, in the future it is planned to improve a number of parameters in order to develop this cooling system to increase its efficiency.
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