结合FIB电路编辑和OBIRCH技术进行故障分析的研究

2009 16th IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits Pub Date : 2009-07-06 DOI:10.1109/IPFA.2009.5232588

J. Yan, Xuesen Liu, Mike Liu, YiLing Liu

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引用次数: 4

摘要

本文讨论了聚焦离子束(FIB)电路编辑与OBIRH技术的结合。FIB可以切断或重新连接集成电路。OBIRCH可以定位故障位置。如果同时应用FIB电路编辑和OBIRCH，我们可以定位故障现场，找到故障的根本原因。本文将分享一个失效分析案例，介绍先进的FIB技术。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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A study of combining FIB circuit edit and OBIRCH technology for failure analysis

This paper discusses combining Focused Ion Beam (FIB) circuit edit with OBIRH technology. FIB can cut or rewire an integrated circuit. OBIRCH can locate failure location. If FIB circuit edit & OBIRCH were applied at the same time, we can locate the failure site and find the root cause of the failure. The paper will share one case of failure analysis and present advanced FIB technology.

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2009 16th IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits

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