纳米压痕过程中单晶镍的位错活性和应力分布:分子动力学模拟

Wenping Wu, Yun-li Li, Zhennan Zhang
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引用次数: 1

摘要

采用分子动力学模拟方法研究了压痕形状对纳米压痕中位错活性和应力分布的影响。采用矩形、球形和Berkovich压头对单晶镍进行了载荷-位移曲线、压痕应力场和位错活动分析。对于矩形压头和球形压头,载荷-位移曲线呈线性关系,但球形压头产生的弹性阶段并不比矩形压头产生的弹性阶段长。对于Berkovich压头,几乎不存在线性弹性区,压头尖端正下方出现非晶态区域,这与压头尖端周围的奇异应力场有关。在三个压头情况下,{111}平面上观察到棱柱形位错环,并且Berkovich压头在压头附近的应力突然增加。应力分布平滑,在低压痕深度处无突发性不规则;随着压痕深度的增加,矩形压痕和球形压痕的应力增大,并出现突然的不规则性。其中,矩形压头的位错活动最为复杂,其次为球形压头,而Berkovich压头的位错活动很少。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Indenter Shape Dependent Dislocation Actives and Stress Distributions of Single Crystal Nickel during Nanoindentation: A Molecular Dynamics Simulation
The influences of indenter shape on dislocation actives and stress distributions during nanoindentation were studied by using molecular dynamics (MD) simulation. The load-displacement curves, indentation-induced stress fields, and dislocation activities were analyzed by using rectangular, spherical, and Berkovich indenters on single crystal nickel. For the rectangular and spherical indenters, the load-displacement curves have a linear dependence, but the elastic stage produced by the spherical indenter does not last longer than that produced by the rectangular indenter. For a Berkovich indenter, there is almost no linear elastic regime, and an amorphous region appears directly below the indenter tip, which is related to the extremely singular stress field around the indenter tip. In three indenters cases, the prismatic dislocation loops are observed on the {111} planes, and there is a sudden increase in stress near the indenter for the Berkovich indenter. The stress distributions are smooth with no sudden irregularities at low-indentation depths; and the stress increases and a sudden irregularity appears with the increasing indentation depths for the rectangular and spherical indenters. Moreover, the rectangular indenter has the most complex dislocation activities and the spherical indenter is next, while very few dislocations occur in the Berkovich indenter case.
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