130 nm InP HBT技术的高线性w波段放大器

R. Maurer, Seong-Kyun Kim, M. Urteaga, M. Rodwell
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引用次数: 0

摘要

我们提出了一种高线性伪差分宽带放大器IC,在1.1×0.72 mm2芯片中采用130 nm InP HBT工艺实现。校正测试结构损耗后,该放大器的输出参考三阶截距点(OIP3)测量值为21.9 dBm,在100 GHz时单级增益为6.4 dB。该放大器在95 GHz时的噪声系数为6.8 dB +/-1dB。在100ghz时,OIP3/Pdc比值为0.79。据作者所知,这些是首次报道的w波段放大器动态范围测量。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
High-Linearity W-Band Amplifiers in 130 nm InP HBT Technology
We present a high-linearity pseudo-differential Wband amplifier IC, implemented in a 130 nm InP HBT process in a 1.1×0.72 mm2 die. Correcting for test structure losses, the amplifier has a measured 21.9 dBm output-referred 3rd order intercept point (OIP3) and a single-stage gain of 6.4 dB at 100 GHz. The amplifier has a noise figure of 6.8 dB +/-1dB at 95 GHz. The OIP3/Pdc ratio is 0.79 at 100 GHz. To the author's knowledge, these are among the first reported dynamic range measurements for W-band amplifiers.
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