金刚石基板上用于射频应用的AlGaN/GaN hemt的电学和热学性能

D. Dumka, T. Chou, J. Jimenez, D. Fanning, D. Francis, F. Faili, F. Ejeckam, M. Bernardoni, J. Pomeroy, Martin Kuball
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引用次数: 46

摘要

基片的导热性影响高功率射频器件的性能。这是目前SiC衬底上GaN hemt的主要限制因素。由于高导热性,金刚石衬底是GaN hemt的一个有吸引力的替代品。我们利用CVD金刚石开发了器件质量的gan -on-金刚石晶圆,并制造了0.25 μm栅极长度的hemt。我们给出了制造器件的详细电学和热学结果,显示射频功率与标准GaN-on-SiC hemt相当。我们证明,与GaN-on-SiC器件相比,这些器件的通道温度降低了25%以上。包括使用直流和射频测试的电气结果以及使用红外热成像和微拉曼光谱的热结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Electrical and Thermal Performance of AlGaN/GaN HEMTs on Diamond Substrate for RF Applications
Thermal conductivity of the substrate affects the performance of high power RF devices. It is a dominant limiting factor in current state-of- the-art GaN HEMTs on SiC substrate. Due to high thermal conductivity, diamond substrate is an attractive alternative for GaN HEMTs. We have developed device quality GaN-on-diamond wafers using CVD diamond and fabricated 0.25 μm gate length HEMTs. We present detailed electrical and thermal results of the fabricated devices, which show RF power comparable to standard GaN-on-SiC HEMTs. We demonstrate over 25 % lower channel temperature for these devices compared to GaN-on-SiC devices. Electrical results using DC and RF tests and thermal results using IR thermography and micro-Raman spectroscopy are included.
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