Ensuring uniform thickness of the conductive coating on the inner surface of the hemispherical resonator by magnetron sputtering

The possibilities of technological ensuring of the uniformity of thickness distribution of a thin-film metal coating produced by magnetron sputtering on the inner surface of a thinwalled silica resonator made in the shape of a hemisphere are considered. The possibility of minimizing the thickness of the coating by optimizing the diameter of the annular magnetron emission zone in combination with the distance from the resonator to the target made of sprayed material is shown. A further increase in the evenness of thickness of the coating is possible on the basis of the use of a fixed screen with a hole, the shape and location of which are calculated analytically, and the final configuration of the contour is specified empirically