{"title":"用Fowler-Nordheim电流测量法测定应力下记忆隧道氧化物中的氧化物电荷重分配","authors":"S. Bernardini, P. Masson, M. Houssa, F. Lalande","doi":"10.1109/ESSDERC.2003.1256945","DOIUrl":null,"url":null,"abstract":"In this work, we present a new approach to determine the spatial oxide fixed charge repartition in memory tunnel oxide from I-V measurements after positive electrical stress. The electron injection current of a tunneling capacitor is computed from the Poisson equation resolution in the dielectric layer. This method allows us to take into account the tunneling barrier deformation due to the presence of charges trapped within the dielectric layer.","PeriodicalId":350452,"journal":{"name":"ESSDERC '03. 33rd Conference on European Solid-State Device Research, 2003.","volume":"51 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2003-09-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Determination of oxide charge repartition in memory tunnel oxide under stress from Fowler-Nordheim current measurements\",\"authors\":\"S. Bernardini, P. Masson, M. Houssa, F. Lalande\",\"doi\":\"10.1109/ESSDERC.2003.1256945\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this work, we present a new approach to determine the spatial oxide fixed charge repartition in memory tunnel oxide from I-V measurements after positive electrical stress. The electron injection current of a tunneling capacitor is computed from the Poisson equation resolution in the dielectric layer. This method allows us to take into account the tunneling barrier deformation due to the presence of charges trapped within the dielectric layer.\",\"PeriodicalId\":350452,\"journal\":{\"name\":\"ESSDERC '03. 33rd Conference on European Solid-State Device Research, 2003.\",\"volume\":\"51 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2003-09-16\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"ESSDERC '03. 33rd Conference on European Solid-State Device Research, 2003.\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ESSDERC.2003.1256945\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"ESSDERC '03. 33rd Conference on European Solid-State Device Research, 2003.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ESSDERC.2003.1256945","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Determination of oxide charge repartition in memory tunnel oxide under stress from Fowler-Nordheim current measurements
In this work, we present a new approach to determine the spatial oxide fixed charge repartition in memory tunnel oxide from I-V measurements after positive electrical stress. The electron injection current of a tunneling capacitor is computed from the Poisson equation resolution in the dielectric layer. This method allows us to take into account the tunneling barrier deformation due to the presence of charges trapped within the dielectric layer.