用不同输运模型分析Si、InAs和Si-InAs隧道二极管和隧道场效应管

A. Schenk, R. Rhyner, M. Luisier, C. Bessire
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引用次数: 18

摘要

本文介绍了硅、InAs和Si-InAs隧道二极管和隧道场效应管的TCAD性能研究。比较短InAs均质二极管的NEGF模拟和Si均质二极管的实验数据有助于校准InAs和Si的隧道模型。对于Si-InAs异质器件的情况,发现了两种变通方法,它们给出了类似的结果。指出了结内和离结带对带隧道的关键区别。而前者不能产生亚热斜率,后者最终可以产生25 mV/dec的点斜率,尽管在非常小的电流水平。TCAD预测Si-InAs异质TFET的最大导通电流为3e-6 a /µm,比世界纪录CMOS低约3个数量级。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Analysis of Si, InAs, and Si-InAs tunnel diodes and tunnel FETs using different transport models
This paper presents a TCAD study on the performance of Si, InAs, and Si-InAs tunnel diodes and tunnel FETs. Comparative NEGF simulations of short InAs homo-diodes and experimental data on Si homo-diodes serve to calibrate the tunnel models for InAs and Si. Two workarounds for the case of Si-InAs hetero devices are found which give similar results. The crucial difference between in-junction and off-junction band-to-band tunneling is pointed out. Whereas the former cannot yield a sub-thermal slope, the latter can eventually produce a point slope of 25 mV/dec, albeit at extremely small current levels. The TCAD prediction for the maximum on-current of a Si-InAs hetero TFET is 3e-6 A/µm, about 3 orders of magnitude less than world-record CMOS.
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