{"title":"用不同输运模型分析Si、InAs和Si-InAs隧道二极管和隧道场效应管","authors":"A. Schenk, R. Rhyner, M. Luisier, C. Bessire","doi":"10.1109/SISPAD.2011.6035075","DOIUrl":null,"url":null,"abstract":"This paper presents a TCAD study on the performance of Si, InAs, and Si-InAs tunnel diodes and tunnel FETs. Comparative NEGF simulations of short InAs homo-diodes and experimental data on Si homo-diodes serve to calibrate the tunnel models for InAs and Si. Two workarounds for the case of Si-InAs hetero devices are found which give similar results. The crucial difference between in-junction and off-junction band-to-band tunneling is pointed out. Whereas the former cannot yield a sub-thermal slope, the latter can eventually produce a point slope of 25 mV/dec, albeit at extremely small current levels. The TCAD prediction for the maximum on-current of a Si-InAs hetero TFET is 3e-6 A/µm, about 3 orders of magnitude less than world-record CMOS.","PeriodicalId":264913,"journal":{"name":"2011 International Conference on Simulation of Semiconductor Processes and Devices","volume":"21 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2011-10-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"18","resultStr":"{\"title\":\"Analysis of Si, InAs, and Si-InAs tunnel diodes and tunnel FETs using different transport models\",\"authors\":\"A. Schenk, R. Rhyner, M. Luisier, C. Bessire\",\"doi\":\"10.1109/SISPAD.2011.6035075\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper presents a TCAD study on the performance of Si, InAs, and Si-InAs tunnel diodes and tunnel FETs. Comparative NEGF simulations of short InAs homo-diodes and experimental data on Si homo-diodes serve to calibrate the tunnel models for InAs and Si. Two workarounds for the case of Si-InAs hetero devices are found which give similar results. The crucial difference between in-junction and off-junction band-to-band tunneling is pointed out. Whereas the former cannot yield a sub-thermal slope, the latter can eventually produce a point slope of 25 mV/dec, albeit at extremely small current levels. The TCAD prediction for the maximum on-current of a Si-InAs hetero TFET is 3e-6 A/µm, about 3 orders of magnitude less than world-record CMOS.\",\"PeriodicalId\":264913,\"journal\":{\"name\":\"2011 International Conference on Simulation of Semiconductor Processes and Devices\",\"volume\":\"21 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2011-10-06\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"18\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2011 International Conference on Simulation of Semiconductor Processes and Devices\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SISPAD.2011.6035075\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2011 International Conference on Simulation of Semiconductor Processes and Devices","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SISPAD.2011.6035075","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 18
摘要
本文介绍了硅、InAs和Si-InAs隧道二极管和隧道场效应管的TCAD性能研究。比较短InAs均质二极管的NEGF模拟和Si均质二极管的实验数据有助于校准InAs和Si的隧道模型。对于Si-InAs异质器件的情况,发现了两种变通方法,它们给出了类似的结果。指出了结内和离结带对带隧道的关键区别。而前者不能产生亚热斜率,后者最终可以产生25 mV/dec的点斜率,尽管在非常小的电流水平。TCAD预测Si-InAs异质TFET的最大导通电流为3e-6 a /µm,比世界纪录CMOS低约3个数量级。
Analysis of Si, InAs, and Si-InAs tunnel diodes and tunnel FETs using different transport models
This paper presents a TCAD study on the performance of Si, InAs, and Si-InAs tunnel diodes and tunnel FETs. Comparative NEGF simulations of short InAs homo-diodes and experimental data on Si homo-diodes serve to calibrate the tunnel models for InAs and Si. Two workarounds for the case of Si-InAs hetero devices are found which give similar results. The crucial difference between in-junction and off-junction band-to-band tunneling is pointed out. Whereas the former cannot yield a sub-thermal slope, the latter can eventually produce a point slope of 25 mV/dec, albeit at extremely small current levels. The TCAD prediction for the maximum on-current of a Si-InAs hetero TFET is 3e-6 A/µm, about 3 orders of magnitude less than world-record CMOS.