主动磁场抵消系统

Weiyang Sun, Feng-Chang Chuang, Yu-Lin Song, Chwen Yu, T. Ma, Tzong-Lin Wu, Luh-Maan Chang
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引用次数: 4

摘要

在新一代纳米晶圆厂中,极低频磁场对成品率有显著影响,特别是当加工深度小于14纳米时。对于sem, tem, stem, FIB写入器和电子束写入器等敏感设备,建议极低频磁场应低于0.5毫高斯以保证良好的良率。因此,迫切需要通过材料屏蔽、导线排列和有源抵消等有源/无源方法来减轻磁场。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Active magnetic field canceling system
The extremely low frequency (ELF) magnetic field has significant impact on yield rate especially when the processing reaches less than 14 nanometer in next-generation nano-Fab. For sensitive equipments such as the SEMs, TEMs, STEMs, FIB writers, and E-beam writers, it suggests that the ELF magnetic field should be lower than 0.5 milli-Gauss to guarantee good yield. Therefore, mitigating the magnetic field by active/passive approaches such as the material shielding, wire permutation, and active canceling are highly demanded.
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