135a x射线激光源的研究进展

M. McGeoch
{"title":"135a x射线激光源的研究进展","authors":"M. McGeoch","doi":"10.1364/eul.1996.es84","DOIUrl":null,"url":null,"abstract":"A repetitively pulsed fast plasma pinch has been used to generate strong emission on a number of transitions in highly ionized carbon, nitrogen, oxygen and neon, at a range of wavelengths between 95 and 350 Angstroms. The transitions are all fed by recombination during the expansion phase of the pinch. A typical starting geometry for the pinch is a helium-filled cylinder of diameter 2.5 cm and length 4 - 8 cm, containing approx 4 % propane, at a total pressure of 1 torr. The outside surface of the pinch cylinder is preionized using RF power before a longitudinal current of 200kA is initiated. The pinch reaches maximum compression and temperature after 150 nsec. The plasma column reaches a diameter of less than 400 microns. Its energy is 150 J and its temperature is estimated to be >100eV. Spectral lines are recorded axially on a 0.5 meter grazing incidence spectrometer. The strongest observed recombination line is from C V (1s2p - ls5d) at 175.67 Angstroms. It has a time-integrated intensity up to 11 times that of the helium II resonance line at 303.78 Angstroms. The latter line is radiatively trapped, representing the maximum brightness that the source can emit other than by the recombination mechanism. Other very strong lines include C VI (2p - 4d) at 134.99 Angstroms, of interest for EUV lithography. The identity of the strong spectral lines, their narrow width and their intensity are indicative of X-ray amplification. Preliminary length scaling shows an increase in intensity of 4x when the pinch length is doubled, from 4 cm to 8 cm.","PeriodicalId":201185,"journal":{"name":"Extreme Ultraviolet Lithography (TOPS)","volume":"111 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Progress on an X-ray laser source at 135 A\",\"authors\":\"M. McGeoch\",\"doi\":\"10.1364/eul.1996.es84\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A repetitively pulsed fast plasma pinch has been used to generate strong emission on a number of transitions in highly ionized carbon, nitrogen, oxygen and neon, at a range of wavelengths between 95 and 350 Angstroms. The transitions are all fed by recombination during the expansion phase of the pinch. A typical starting geometry for the pinch is a helium-filled cylinder of diameter 2.5 cm and length 4 - 8 cm, containing approx 4 % propane, at a total pressure of 1 torr. The outside surface of the pinch cylinder is preionized using RF power before a longitudinal current of 200kA is initiated. The pinch reaches maximum compression and temperature after 150 nsec. The plasma column reaches a diameter of less than 400 microns. Its energy is 150 J and its temperature is estimated to be >100eV. Spectral lines are recorded axially on a 0.5 meter grazing incidence spectrometer. The strongest observed recombination line is from C V (1s2p - ls5d) at 175.67 Angstroms. It has a time-integrated intensity up to 11 times that of the helium II resonance line at 303.78 Angstroms. The latter line is radiatively trapped, representing the maximum brightness that the source can emit other than by the recombination mechanism. Other very strong lines include C VI (2p - 4d) at 134.99 Angstroms, of interest for EUV lithography. The identity of the strong spectral lines, their narrow width and their intensity are indicative of X-ray amplification. Preliminary length scaling shows an increase in intensity of 4x when the pinch length is doubled, from 4 cm to 8 cm.\",\"PeriodicalId\":201185,\"journal\":{\"name\":\"Extreme Ultraviolet Lithography (TOPS)\",\"volume\":\"111 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Extreme Ultraviolet Lithography (TOPS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1364/eul.1996.es84\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Extreme Ultraviolet Lithography (TOPS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/eul.1996.es84","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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摘要

在高度电离的碳、氮、氧和氖中,使用重复脉冲快速等离子体夹尖在波长范围在95至350埃之间的许多跃迁上产生强发射。这些跃迁都是在挤压膨胀阶段通过复合来实现的。夹紧的典型初始几何形状是一个直径2.5厘米,长度4 - 8厘米的氦气填充圆柱体,其中含有约4%的丙烷,总压力为1托。在启动200kA的纵向电流之前,使用射频功率将夹紧筒的外表面预电离。挤压在150秒后达到最大压缩和温度。等离子体柱的直径小于400微米。其能量为150j,温度估计大于100eV。谱线在0.5米掠入射光谱仪上轴向记录。在175.67埃处观测到最强的复合谱线来自于cv (1s2p - ls5d)。它的时间积分强度是氦II共振线303.78埃的11倍。后一条线是辐射捕获的,表示源可以发出的最大亮度,而不是通过重组机制。其他非常强的谱线包括134.99埃的cvi (2p - 4d),这是EUV光刻的兴趣点。强谱线的特性,它们的窄宽度和强度表明了x射线的放大。初步长度缩放显示,当捏缩长度增加一倍时,强度增加4倍,从4厘米增加到8厘米。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Progress on an X-ray laser source at 135 A
A repetitively pulsed fast plasma pinch has been used to generate strong emission on a number of transitions in highly ionized carbon, nitrogen, oxygen and neon, at a range of wavelengths between 95 and 350 Angstroms. The transitions are all fed by recombination during the expansion phase of the pinch. A typical starting geometry for the pinch is a helium-filled cylinder of diameter 2.5 cm and length 4 - 8 cm, containing approx 4 % propane, at a total pressure of 1 torr. The outside surface of the pinch cylinder is preionized using RF power before a longitudinal current of 200kA is initiated. The pinch reaches maximum compression and temperature after 150 nsec. The plasma column reaches a diameter of less than 400 microns. Its energy is 150 J and its temperature is estimated to be >100eV. Spectral lines are recorded axially on a 0.5 meter grazing incidence spectrometer. The strongest observed recombination line is from C V (1s2p - ls5d) at 175.67 Angstroms. It has a time-integrated intensity up to 11 times that of the helium II resonance line at 303.78 Angstroms. The latter line is radiatively trapped, representing the maximum brightness that the source can emit other than by the recombination mechanism. Other very strong lines include C VI (2p - 4d) at 134.99 Angstroms, of interest for EUV lithography. The identity of the strong spectral lines, their narrow width and their intensity are indicative of X-ray amplification. Preliminary length scaling shows an increase in intensity of 4x when the pinch length is doubled, from 4 cm to 8 cm.
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