多节点扰动下单事件硬化纳米级存储单元建模与设计

Sheng Lin, Yong-Bin Kim, F. Lombardi
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引用次数: 8

摘要

在纳米级CMOS中,由于器件尺寸减小和电源电压缩放,多节点翻转的发生可能会显著增加。本文提出了一种综合处理方法(模型、分析和设计),用于硬化存储单元,以防止在CMOS中32nm特征尺寸下导致多节点破坏的软错误。提出了一种新的13T存储单元配置,分析并模拟了它对可能的多节点故障(即影响单元中任意两个节点的瞬态或软故障)有更好的容忍度。所提出的硬化存储单元采用施密特触发器设计;仿真结果表明,与现有设计相比,多节点扰动容忍度提高了近两倍。此外,与DICE单元(由12个晶体管组成)相比,13T单元的写入延迟减少了33%,功耗仅增加了5%。利用CMOS中32nm特征尺寸的预测技术文件,给出了仿真结果。蒙特卡罗模拟证实了所提出的存储单元在其设计中存在工艺,电压和温度变化的情况下具有出色的多节点干扰容忍度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Modeling and design of a nanoscale memory cell for hardening to a single event with multiple node upset
The occurrence of a multiple node upset is likely to increase significantly in nanoscale CMOS due to reduced device size and power supply voltage scaling. This paper presents a comprehensive treatment (model, analysis and design) for hardening a memory cell against a soft error resulting in a multiple node upset at 32nm feature size in CMOS. A novel 13T memory cell configuration is proposed, analyzed, and simulated to show a better tolerance to the likely multiple node upset, i.e. a transient or soft fault affecting any two nodes in a cell. The proposed hardened memory cell utilizes a Schmitt trigger design; simulation shows that the multiple node upset tolerance is improved by nearly twice as much over existing designs. Moreover the 13T cell achieves a 33% reduction in write delay and only a 5% increase in power consumption compared to the DICE cell (consisting of 12 transistors). Simulation results are provided using the predictive technology file for 32nm feature size in CMOS. Monte Carlo simulation confirms the excellent multiple node upset tolerance of the proposed memory cell in the presence of process, voltage, and temperature variations in their designs.
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