了解模拟设计中的MOSFET失配

P. Drennan, C. McAndrew
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引用次数: 324

摘要

本文解决了模拟设计中关于MOSFET失配的误解。V/sub / t/失配不遵循简单的1/(/spl半径/面积)定律,特别是对于宽/短和窄/长器件,这是模拟电路中常见的几何形状。此外,Vt和增益因子不是建模不匹配的合适参数。基于物理的失配模型可以在失配预测方面获得显著的改进。该模型应用于MOSFET电流反射镜,以显示对偏置,几何形状和多单元器件的一些非明显影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Understanding MOSFET mismatch for analog design
This paper addresses misconceptions about MOSFET mismatch for analog design. V/sub t/ mismatch does not follow a simplistic 1/(/spl radic/area) law, especially for wide/short and narrow/long devices, which are common geometries in analog circuits. Further, Vt and gain factor are not appropriate parameters for modeling mismatch. A physically based mismatch model can be used to obtain dramatic improvements in the prediction of mismatch. This model is applied to MOSFET current mirrors to show some non-obvious effects over bias, geometry, and multiple unit devices.
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