{"title":"纳米技术时代集成电路的设计、制造和测试","authors":"O. Kebichi","doi":"10.1109/IDT.2014.7038579","DOIUrl":null,"url":null,"abstract":"This article is meant to highlight the state of the art of chip design, manufacturing and test and the challenges it is facing while keeping up with Moore's law at the nanoscale technology node. We will outline the different challenges the semiconductor industry is facing at sub-45 nm and highlight the different approaches the engineering community is adopting in the design, manufacturing and test fields.","PeriodicalId":122246,"journal":{"name":"2014 9th International Design and Test Symposium (IDT)","volume":"35 6 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2014-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Design, manufacturing & test of integrated circuits in the nanotechnology era\",\"authors\":\"O. Kebichi\",\"doi\":\"10.1109/IDT.2014.7038579\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This article is meant to highlight the state of the art of chip design, manufacturing and test and the challenges it is facing while keeping up with Moore's law at the nanoscale technology node. We will outline the different challenges the semiconductor industry is facing at sub-45 nm and highlight the different approaches the engineering community is adopting in the design, manufacturing and test fields.\",\"PeriodicalId\":122246,\"journal\":{\"name\":\"2014 9th International Design and Test Symposium (IDT)\",\"volume\":\"35 6 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2014-12-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2014 9th International Design and Test Symposium (IDT)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IDT.2014.7038579\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2014 9th International Design and Test Symposium (IDT)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IDT.2014.7038579","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Design, manufacturing & test of integrated circuits in the nanotechnology era
This article is meant to highlight the state of the art of chip design, manufacturing and test and the challenges it is facing while keeping up with Moore's law at the nanoscale technology node. We will outline the different challenges the semiconductor industry is facing at sub-45 nm and highlight the different approaches the engineering community is adopting in the design, manufacturing and test fields.