纳米技术时代集成电路的设计、制造和测试

O. Kebichi
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引用次数: 0

摘要

本文旨在重点介绍芯片设计、制造和测试的最新技术状况,以及在纳米技术节点上跟上摩尔定律所面临的挑战。我们将概述半导体行业在45纳米以下面临的不同挑战,并重点介绍工程界在设计、制造和测试领域采用的不同方法。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Design, manufacturing & test of integrated circuits in the nanotechnology era
This article is meant to highlight the state of the art of chip design, manufacturing and test and the challenges it is facing while keeping up with Moore's law at the nanoscale technology node. We will outline the different challenges the semiconductor industry is facing at sub-45 nm and highlight the different approaches the engineering community is adopting in the design, manufacturing and test fields.
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