SiC衬底生长AlGaN/GaN hemt的可靠性评价

C. Lee, L. Witkowski, M. Muir, H. Tserng, P. Saunier, H. Wang, J. Yang, M.A. Khan
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引用次数: 16

摘要

AlGaN/GaN hemt在微波频率下实现了创纪录的输出功率密度;然而,这些设备的可靠性仍然是一个主要问题。本文讨论了钝化75 /spl mu/m器件在几种漏极电压下的直流和射频应力测试结果。直流应力48小时后,在一些器件中观察到in和小信号性能的差异可以忽略不计,而在其他一些器件中测量到漏极电流显著降低、跨导减小和导通电阻增加。40小时的射频应力导致10 GHz时的跨导和漏极电流降低,功率性能下降。对应力前后的等效电路模型进行了全面比较。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Reliability evaluation of AlGaN/GaN HEMTs grown on SiC substrate
AlGaN/GaN HEMTs have achieved record output power densities at microwave frequencies; however, reliability of these devices is still a major concern. In this paper, the results of DC and RF stress tests at several drain voltages of passivated 75 /spl mu/m devices are discussed. After DC stress for 48 hours, negligible differences in IN and small signal performance were observed in some devices, while significant reduction in drain current, decrease in transconductance, and increase in on-resistance were measured in some other devices. RF stress for 40 hours has resulted in lower transconductance and drain current and degradation in power performance at 10 GHz. A comprehensive comparison of equivalent circuit models before and after stress is presented.
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