单轴压力对半导体中h中心光离的影响

A. Abramov, V. Akimov, A. Dalakyan, D. Firsov, V. Tulupenko, F. Vasko
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引用次数: 0

摘要

计算了锗等单轴变形半导体在跃迁到价带时,具有短距离电位的深中心空穴局部化的光电离截面。由于受体能级和空穴子带极值的分裂,光电离阈值也发生了分裂,出现了四种跃迁。随着温度的升高,杂质分裂态的居数发生变化。这导致各种跃迁对吸收系数的贡献发生变化。由于变形破坏了问题的球对称性,吸收系数出现了明显的极化依赖性。计算基于一般的量子力学公式,采用变形下杂质中心波函数的过渡矩阵元。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Influence of uniaxial pressure on the photoionization of h-centers in semiconductors
Photoionization cross section of holes localization on deep centers with short distance potential at their transitions to the valence band of the uniaxially deformed semiconductor like Ge has been calculated. Because of splitting both acceptor level and extremum of hole subbands, photoionization threshold splits also - four kinds of such transitions appear. While growing temperature, the alteration of population of splitted impurity states occurs. It result in changing contribution of each kind of transitions to the absorption coefficient. As deformation disturbs spherical symmetry of the problem, appreciable polarization dependence of absorption coefficient appears. The calculation is based on the general quantum mechanic formula with transition matrix element using wave function of impurity center under deformation.
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