M. Pfeffer, C. Zängle, A. Bauer, G. Schneider, P. Franze
{"title":"功率器件制造中先进晶圆容器污染控制方法与策略","authors":"M. Pfeffer, C. Zängle, A. Bauer, G. Schneider, P. Franze","doi":"10.1109/ISSM.2018.8651151","DOIUrl":null,"url":null,"abstract":"Power devices and power electronic systems are key components in various applications. Driven by market and volume requirements manufacturers are moving towards fully automated 300 mm manufacturing lines, which typically utilize closed wafer containers like FOUPs (Front Opening Unified Pods) and FOSBs (Front Opening Shipping Boxes). Power semiconductor manufacturing technologies require very complex tool dedications in order to increase yield and to avoid excursions in electrical performance due to critical contaminants like AMC (airborne molecular contamination). An optimized cleaning and contamination monitoring strategy for wafer containers will rely on advanced sampling and analysis capabilities, which need to be further elaborated.","PeriodicalId":262428,"journal":{"name":"2018 International Symposium on Semiconductor Manufacturing (ISSM)","volume":"54 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Advanced Wafer Container Contamination Control Methods and Strategies in Power Device Manufacturing\",\"authors\":\"M. Pfeffer, C. Zängle, A. Bauer, G. Schneider, P. Franze\",\"doi\":\"10.1109/ISSM.2018.8651151\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Power devices and power electronic systems are key components in various applications. Driven by market and volume requirements manufacturers are moving towards fully automated 300 mm manufacturing lines, which typically utilize closed wafer containers like FOUPs (Front Opening Unified Pods) and FOSBs (Front Opening Shipping Boxes). Power semiconductor manufacturing technologies require very complex tool dedications in order to increase yield and to avoid excursions in electrical performance due to critical contaminants like AMC (airborne molecular contamination). An optimized cleaning and contamination monitoring strategy for wafer containers will rely on advanced sampling and analysis capabilities, which need to be further elaborated.\",\"PeriodicalId\":262428,\"journal\":{\"name\":\"2018 International Symposium on Semiconductor Manufacturing (ISSM)\",\"volume\":\"54 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2018-12-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2018 International Symposium on Semiconductor Manufacturing (ISSM)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISSM.2018.8651151\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 International Symposium on Semiconductor Manufacturing (ISSM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISSM.2018.8651151","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Advanced Wafer Container Contamination Control Methods and Strategies in Power Device Manufacturing
Power devices and power electronic systems are key components in various applications. Driven by market and volume requirements manufacturers are moving towards fully automated 300 mm manufacturing lines, which typically utilize closed wafer containers like FOUPs (Front Opening Unified Pods) and FOSBs (Front Opening Shipping Boxes). Power semiconductor manufacturing technologies require very complex tool dedications in order to increase yield and to avoid excursions in electrical performance due to critical contaminants like AMC (airborne molecular contamination). An optimized cleaning and contamination monitoring strategy for wafer containers will rely on advanced sampling and analysis capabilities, which need to be further elaborated.