基于边界陷阱的SiC晶体管转移特性建模

S. Tyaginov, M. Jech, G. Rzepa, A. Grill, A. El-Sayed, G. Pobegen, A. Makarov, T. Grasser
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引用次数: 4

摘要

我们从实验和理论上研究了界面和边界陷阱对在200-350 K宽温度范围内测量的4H-SiC晶体管转移特性的影响。很明显,实验电流-电压特性的漏极电流比没有陷阱的模拟得到的漏极电流低得多。此外,在整个栅极电压范围内,电流随着温度的升高而增加,而阈值电压随着温度的升高而向更低的值移动。我们表明,虽然界面陷阱可以很好地解释在室温下测量的${I}_{{\mathrm {d}}}-{V}_{{\mathrm {gs}}}$曲线,但在较低的温度下就失效了。另一方面,在整个温度范围内,边界陷阱的包含使实验和模拟的电流-电压特性很好地吻合。我们第一次能够成功地表示温度低于300 K的4H-SiC晶体管的转移特性。因此,我们得出结论,边界陷阱是导致$\mathrm{I}_{{\mathrm {d}} -\mathrm{V}_{{\mathrm {gs}}}$特征的复杂行为的原因。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Border Trap Based Modeling of SiC Transistor Transfer Characteristics
We experimentally and theoretically study the impact of interface and border traps on the transfer characteristics of 4H-SiC transistors measured over a wide temperature range of 200-350 K. Quite apparently, the experimental current-voltage characteristics have drain currents which are much lower than those obtained from simulations performed without traps. Moreover, currents increase with temperature over the entire gate voltage range, while the threshold voltage shifts towards lower values as temperature increases. We show that although interface traps can explain ${I}_{{\mathrm {d}}}-{V}_{{\mathrm {gs}}}$ curves measured at room temperature with good accuracy it fails for lower temperatures. Inclusion of border traps, on the other hand, results in good agreement between experimental and simulated current-voltage characteristics over the entire temperature range. For the first time we were able to successfully represent transfer characteristics of a 4H-SiC transistor at temperatures substantially below 300 K. Therefore, we conclude that border traps are responsible for the complicated behavior of $\mathrm{I}_{{\mathrm {d}}}-\mathrm{V}_{{\mathrm {gs}}}$ characteristics.
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