恒流扫描场发射显微镜(SFEM)中的非地形对比

2020 33rd International Vacuum Nanoelectronics Conference (IVNC) Pub Date : 2020-07-01 DOI:10.1109/IVNC49440.2020.9203360

D. Westholm, J. Wei, G. Bertolini, O. Gürlü, D. Pescia, U. Ramsperger

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引用次数: 1

摘要

扫描隧道显微镜在常规(隧道)和场发射体制下进行。在恒流模式下，分别对含碳和不含碳的W(110)表面进行了成像，在恒流模式下，尖端与目标的垂直距离位移分别补偿了隧穿场发射电流的变化。在场发射状态下，我们观察到与地形对比度无关的尖端目标位移。

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Non-topographic contrast in constant-current Scanning Field-Emission Microscopy (SFEM)

Scanning Tunneling Microscopy is performed in the conventional (tunneling) and in the field-emission regime. Images of W(110)-surfaces with and without some carbon content are taken in the constant current mode, in which the tip-target vertical distance displaces to compensate for the changes of the tunneling, respectively, field emission current. In the field emission regime, we observe tip-target displacements that are not related to the topographic contrast.

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2020 33rd International Vacuum Nanoelectronics Conference (IVNC)

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