基于雪崩倍增效应GaP的金属介电结构特性研究

V. Rud, D. Melebaev, I. Trapeznikova, M. Diuldin, M. Yakusheva, N. Bykova
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引用次数: 0

摘要

在肖特基势垒物理领域,金属-半导体、金属-介电-半导体纳米技术,特别是纳米结构,被用于制造高效的可见光和紫外线光电探测器。在hv>5的紫外范围内,光敏MDS纳米结构。在eV中,发现了巨大的光敏性,这与块电荷层中的雪崩倍增以及金属纳米层Au和宽带氧化物Ga2O3 (Fe)的性质有关。需要强调的是,将金纳米层应用于氧化层表面,在体电荷内部电场的影响下,可以获得新的性能,这使得基于GAP MDS纳米结构的新型光电子器件成为可能,具有广泛的应用前景。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Features of Metal Dielectric Structures Based on GaP with Avalanche Multiplication Effect
In the field of Schottky barrier physics, metal- semiconductor, metal-dielectric-semiconductor nanotechnology, in particular nanostructuring, are used to create highly efficient photodetectors of visible and ultraviolet radiation. In photosensitive MDS nanostructures in the UV range at hv>5.l eV, a giant photosensitivity was detected, which is associated with avalanche multiplication in the bulk charge layer and the properties of the metal nanolayers Au and the wide-band oxide Ga2O3 (Fe). It is important to emphasize that the gold nanolayer applied to the surface of the oxide layer, under the influence of the internal electric field of the bulk charge, can acquire new properties, which makes it possible to create a new type of optoelectronic devices based on GAP MDS nanostructures, which can be widely used.
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