MANOS电池在工作条件下的芯片级可靠性

Eun-Seok Choi, Se-Jun Kim, Soon-Ok Seo, Hyunseung Yoo, Kyoung-Hwan Park, Sung-Wook Jung, Se-yun Lim, H. Joo, Gyo-Ji Kim, Sang-Bum Lee, Sang-Hyun Oh, J. Om, J. Yi, Seok-Kiu Lee
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引用次数: 4

摘要

从细胞阵列上检验了MANOS细胞的MT可靠性。即使在rt时也出现了大量的保留尾位。失败细胞被归类为q-loss的方式。缺陷细胞在早期损失大量电荷,而缺陷细胞的q损失速率更快,并持续一定时间。我们的氮化物中的硅簇被认为是较差的电池,该电池通过减少富硅氮化物中的浅阱来弥补其保留能力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Chip Level Reliability of MANOS Cells under Operating Conditions
MT reliability of MANOS cell was examined from cell array. Lots of retention tail bits occurred even at RT. The fail cells were classified as the manner of q-loss. Defective cell lost abundant charge at early stage, while the q-loss rate of worse cell was faster and lasted in a certain period. Si-cluster in our nitride was supposed to make the worse cell, and this cell redeemed its retention capability by reducing shallow trap in Si-rich nitride.
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