{"title":"CMOS霍尔效应器件的单相和多相偏置数值估计","authors":"M. Paun","doi":"10.1109/IWASI.2015.7184972","DOIUrl":null,"url":null,"abstract":"The present work is focused on characterizing the behaviour of Hall Effect devices integrated in a regular bulk 0.35 μm CMOS technology, by providing amongst other, numerical data regarding their sensitivity, single and multi-phase offset. Also, the paper investigates the parabolic variation of the residual offset with the biasing current and the encapsulation offset. Temperature drifts of the main parameters are also included. Three-dimensional physical models for the CMOS Hall structures have been developed, in order to analyze their performance.","PeriodicalId":395550,"journal":{"name":"2015 6th International Workshop on Advances in Sensors and Interfaces (IWASI)","volume":"105 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2015-06-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Single and multi-phase offset numerical estimation for CMOS hall effect devices\",\"authors\":\"M. Paun\",\"doi\":\"10.1109/IWASI.2015.7184972\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The present work is focused on characterizing the behaviour of Hall Effect devices integrated in a regular bulk 0.35 μm CMOS technology, by providing amongst other, numerical data regarding their sensitivity, single and multi-phase offset. Also, the paper investigates the parabolic variation of the residual offset with the biasing current and the encapsulation offset. Temperature drifts of the main parameters are also included. Three-dimensional physical models for the CMOS Hall structures have been developed, in order to analyze their performance.\",\"PeriodicalId\":395550,\"journal\":{\"name\":\"2015 6th International Workshop on Advances in Sensors and Interfaces (IWASI)\",\"volume\":\"105 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2015-06-18\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2015 6th International Workshop on Advances in Sensors and Interfaces (IWASI)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IWASI.2015.7184972\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2015 6th International Workshop on Advances in Sensors and Interfaces (IWASI)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IWASI.2015.7184972","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Single and multi-phase offset numerical estimation for CMOS hall effect devices
The present work is focused on characterizing the behaviour of Hall Effect devices integrated in a regular bulk 0.35 μm CMOS technology, by providing amongst other, numerical data regarding their sensitivity, single and multi-phase offset. Also, the paper investigates the parabolic variation of the residual offset with the biasing current and the encapsulation offset. Temperature drifts of the main parameters are also included. Three-dimensional physical models for the CMOS Hall structures have been developed, in order to analyze their performance.