斜电压击穿试验可靠性的确定双介质MIM电容器的应用

M. Shatzkes, M. Av-Ron, K. Srikrishnan
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引用次数: 2

摘要

用斜电压击穿实验推导了Ta2O5-Si3N4双介质电容器寿命¿(v)与外加电压的关系。先前描述的技术允许识别早期击穿的缺陷电容器,以及捕获注入载流子的效果,这延缓了击穿。它就在那里。有可能确定无电荷无缺陷电容器的¿(v) -可靠性的兴趣量。对于非乐观可靠性预测,必须在电压范围内获得¿(v),以便在该范围的较低部分,log¿(v) vs . v呈现向上的凹度。这样得到的投影在寿命试验中得到了验证。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Determination of Reliability from Ramped Voltage Breakdown Experiments; Application to Dual Dielectric MIM Capacitors
Ramped voltage breakdown experiments were used to derive the dependence of life-time, ¿(v), on the applied voltage for Ta2O5-Si3N4 dual dielectric capacitors. Techniques previously described allowed for recognition of defective capacitors, which break down early, and for the effect of trapping of injected carriers, which retards the breakdown. It is there. ore possible to determine ¿(v) for charge-free nondefective capacitors--a quantity of interest for reliability. For nonoptimistic reliability projections, ¿(v) must be obtained over a range in voltage so that log ¿(v) versus v exhibits, at the lower portion of that range, an upward concavity. Projections thus obtained were verified in a life-test.
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