高速ECL技术和互连技术的进展

K. Ohno
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引用次数: 0

摘要

探讨了双极硅技术的最新发展和先进的ECL(发射极耦合逻辑)IC器件的生产。改进的结构技术和器件缩放是提高性能的主要贡献者。举例说明了这些硅技术如何与高密度封装相结合,并用于实现今天的“超级计算机”。减少基本门延迟和片上布线延迟的影响与相对较长的互连延迟对整个系统性能的影响进行了对比。旨在改善基本栅极延迟和布线延迟的进一步发展仍在继续,甚至更高性能的双极硅器件将继续发展。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Advances in high speed ECL technology and interconnection techniques
Explores recent developments in bipolar silicon technology and the production of advanced ECL (Emitter Coupled Logic) IC devices. Refined structural techniques and device scaling have been the major contributors to improved performance. Examples are given of how these silicon techniques have been combined with high density packaging and used to implement today's 'super computers'. The effect of reduced basic gate delays and on-chip wiring delays is contrasted with the effect of relatively long interconnection delays on the whole system performance. Further developments aimed at improving both basic gate delay and wiring delay are continuing, and even higher performance bipolar silicon devices will continue.<>
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