薄膜与衬底热膨胀差异对铋薄膜热电性能的影响

V.A. Komvarov, V. Grabov, O. Uryupin
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引用次数: 1

摘要

介绍了不同衬底上铋薄膜热电性能的研究结果。在真空中通过蒸发得到薄膜。薄膜的厚度从0.05微米到1.5微米不等。发现温度膨胀铋和衬底材料的区别对铋薄膜热电性能有很大影响。衬底在温度降低时变形成铋薄膜。这种平面拉伸或压缩变形与平面垂直方向(沿轴C/sub 3/)的轴向压缩或拉伸变形相似。设计了载流子浓度随薄膜-衬底系统机械变形的变化规律。计算了不同衬底上铋膜载流子浓度的变化。这些结果与实验结果吻合得很好。铋薄膜的塞贝克系数特性受竞争膜尺寸效应、边界晶体弛豫效应以及薄膜热膨胀系数和衬底薄膜变形差异的影响。薄膜与衬底热膨胀差异所包含的铋薄膜机械变形改变了部分路径输运系数值及其比值,并由此改变了塞贝克系数值和温度依赖形式。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Influence of films and substrates thermal expansion discrepancy on bismuth film thermoelectric properties
The results of bismuth films on various substrates thermoelectric properties research are brought. A film are received by evaporation in vacuum. A film had thickness from 0.05 micron up to 1.5 micron. It is found out large influence of temperature expansion bismuth and substrate materials distinction on bismuth films thermoelectric properties. The substrate deforms a bismuth films at temperature reduction. This planar tension or compressing deformation is similar of axial compressing or tension deformation in plane perpendicular direction (along an axis C/sub 3/). Change of charge carriers concentration on mechanical deformations included in film-substrate system is designed. Change of charge carriers concentration in bismuth films on various substrates is calculated. These results well coincide with received from experiment. The bismuth films Seebeck coefficient peculiarities governed by competition film size effect, borders crystallite relaxation effect and included thermal expansion coefficients film and substrate discrepancy film deformation. The included of films and substrates thermal expansion discrepancy bismuth films mechanical deformation changes partial path transport coefficient values and its ratio and in consequence of changes Seebeck coefficient values and temperature dependence form.
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