工艺多电路优化

Proceedings 1998 Design and Automation Conference. 35th DAC. (Cat. No.98CH36175) Pub Date : 1998-05-01 DOI:10.1145/277044.277149

A. Lokanathan, J. Brockman

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引用次数: 0

摘要

本文描述了集成电路优化的并行方法的实现，该方法跨越了制造工艺设计和电路设计学科。与单独的过程/电路优化相比，该方法的结果显示了显著的性能提升，并且比“一次性”组合优化节省了大量的时间。

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Process multi-circuit optimization

This paper describes the implementation of a concurrent methodology for integrated circuit optimization that spans the fabrication process design and circuit design disciplines. Results from this methodology show substantial performance gains as compared to a separate process/circuit optimization and a substantial time savings over an "all-at-once" combined optimization.

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来源期刊

Proceedings 1998 Design and Automation Conference. 35th DAC. (Cat. No.98CH36175)

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