{"title":"封装中超大规模集成电路瞬态热点快速评估方法","authors":"Je-Hyoung Park, A. Shakouri, S. Kang","doi":"10.1109/ISQED.2008.95","DOIUrl":null,"url":null,"abstract":"Recently VLSI IC design is concerned with the large temperature non-uniformity in high power chips. Thus far, thermal simulations have been limited to steady-state worst case conditions, which have caused the use of conservative margins in thermal designs. Transient temperature characteristics were not simulated in prior art chip-level simulations due to the high computational expense. To drastically reduce the time for the chip-level thermal simulations, we have developed a matrix convolution technique, called the Power Blurring (PB) method. Our method renders the temperature profile of a packaged IC with maximum error less than 3% for several case studies done and reduces the computation time by a factor of 100, compared to the simulations done by the industry standard finite element tools.","PeriodicalId":243121,"journal":{"name":"9th International Symposium on Quality Electronic Design (isqed 2008)","volume":"101 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2008-03-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"12","resultStr":"{\"title\":\"Fast Evaluation Method for Transient Hot Spots in VLSI ICs in Packages\",\"authors\":\"Je-Hyoung Park, A. Shakouri, S. Kang\",\"doi\":\"10.1109/ISQED.2008.95\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Recently VLSI IC design is concerned with the large temperature non-uniformity in high power chips. Thus far, thermal simulations have been limited to steady-state worst case conditions, which have caused the use of conservative margins in thermal designs. Transient temperature characteristics were not simulated in prior art chip-level simulations due to the high computational expense. To drastically reduce the time for the chip-level thermal simulations, we have developed a matrix convolution technique, called the Power Blurring (PB) method. Our method renders the temperature profile of a packaged IC with maximum error less than 3% for several case studies done and reduces the computation time by a factor of 100, compared to the simulations done by the industry standard finite element tools.\",\"PeriodicalId\":243121,\"journal\":{\"name\":\"9th International Symposium on Quality Electronic Design (isqed 2008)\",\"volume\":\"101 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2008-03-17\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"12\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"9th International Symposium on Quality Electronic Design (isqed 2008)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISQED.2008.95\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"9th International Symposium on Quality Electronic Design (isqed 2008)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISQED.2008.95","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Fast Evaluation Method for Transient Hot Spots in VLSI ICs in Packages
Recently VLSI IC design is concerned with the large temperature non-uniformity in high power chips. Thus far, thermal simulations have been limited to steady-state worst case conditions, which have caused the use of conservative margins in thermal designs. Transient temperature characteristics were not simulated in prior art chip-level simulations due to the high computational expense. To drastically reduce the time for the chip-level thermal simulations, we have developed a matrix convolution technique, called the Power Blurring (PB) method. Our method renders the temperature profile of a packaged IC with maximum error less than 3% for several case studies done and reduces the computation time by a factor of 100, compared to the simulations done by the industry standard finite element tools.