第一级封装中的低温互连及其挑战

C. Arvin, S. Lim, David Locker, W. K. Loh, K. Sweatman, Francis Lee, M. Tsuriya
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引用次数: 0

摘要

本文回顾了一级互连的材料和工艺,并试图了解如何利用低温材料来满足一级封装的未来需求。我们进行了一项行业调查,以了解需要使用低温材料的关键驱动因素。这些是热敏元件的结合,先进基板材料的利用,薄基板/组件的翘曲控制和节能。有三种方法可以整合这些低温材料:1)用低温材料完全取代互连材料,2)使用传统焊料连接某些项目,然后使用低温材料连接热敏元件的第二个连接步骤,3)连接具有传统SAC焊料但在基板侧具有低温材料的组件或模具。低熔点锡铋合金已经被引入到板级组装中,被强调为这些一级互连的潜在候选者。这些合金的性能是否符合一级互连的要求,如处理器附近的细间距连接,还有待证实。问题包括α发射、微观结构稳定性、对电迁移的易感性、晶须生长以及在低温下锡相多晶态转变的可能性,一些处理器可能暴露在低温下。对于高频电路,还需要了解互连材料的电感和电容特性。考虑到在红外焦平面阵列附件中发现的低熔点铟合金是否可以用于其他器件。在低熔点合金的性能可能不足以应付可能的使用条件时,讨论了连接后的工艺,以将低熔点材料转化为高熔点的最终接头,该接头主要由金属间化合物组成。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Low temperature interconnects in 1st level packaging and its challenges
This paper reviews the materials and processes of 1st level interconnects and seeks to understand how utilization of low temperature materials can enable the future needs of 1st level packages. An industry survey was administered to understand the key drivers that necessitate the use of low temperature materials. These were incorporation of thermal sensitive components, utilization of advanced substrate materials, warpage control of thinned substrates / components and energy reduction. There were three approaches mentioned to incorporate these low temperature materials: 1) replace the interconnect materials completely with low temperature materials, 2) use traditional solders for attachment of certain items followed by second attachment steps using low temperature materials for thermal sensitive elements and 3) attach a component or die that has traditional SAC solder on it but has low temperature materials on the substrate side. Low melting point tin-bismuth alloys that have been introduced to board level assembly were highlighted as potential candidates for these 1st level interconnects. It had yet to be confirmed that properties of these alloys were consistent with the requirements of 1st level interconnects such as fine pitch connections near the processor. Concerns included alpha emissions, microstructural stability, susceptibility to electromigration, whisker growth, and possibility of polymorphic transformation of tin phase at cryogenic temperatures to which some processors might be exposed. For high frequency circuitry the inductance and capacitance properties of the interconnect materials also needed to be understood. Consideration was given to whether the low melting point indium alloys that have found application in the attachment of IR Focal Plane Arrays could be used for other devices. Where the properties of low melting point alloys might not be sufficient to cope with possible service conditions, post joining processes were discussed to convert the low melting point materials to a higher melting point final joint that were comprised substantially of intermetallic compounds.
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