雪崩击穿-双注入诱导半导体负电阻

S. Steele, A. Ando, L. Lampert
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引用次数: 27

摘要

电流控制的负电阻已经在各种点接触锗二极管中观察到。实验在300°K和243°K下进行,使用直流和脉冲电流。在这些实验中,两个触点都是欧姆的,非注入型的。这种效应已经在n型和p型锗单晶中被观察到,其电阻率范围从0.1到50欧姆-厘米。由负电阻引起的弛豫振荡的频率范围从1 KG到10 MC,这取决于阴极-阳极间距和所使用的外部电容。分析表明,热效应不能解释这些结果。负电阻被认为是由于在接触点产生雪崩注入后,大块材料中的两个载流子流(双注入)。这种对负电阻的解释不同于先前提出的解释,并允许对I-V曲线以及频率限制进行预测。实验用不同大小的点,不同的拉力…
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Avalanche breakdown-double injection induced negative resistance in semiconductors
Current-controlled negative resistances have been observed in a variety of point-contact Ge diodes. Experiments were done at 300°K and 243°K, using both dc and pulsed currents. In these experiments both contacts are of the ohmic, non-injecting type. The effect has been seen in both n and p -type Ge single crystals having resistivities that range from 0.1 to 50 ohm-cm. The frequency of the relaxation oscillations resulting from the negative resistance has ranged from 1 KG to 10 MC depending on the cathode-anode spacing and the external capacitance used. Analysis shows that thermal effects can not explain these results. The negative resistance is believed to be due to the two carrier current flow (double injection) in the bulk material after avalanche injection has been produced at the point contact. This explanation for the negative resistance differs from those previously proposed and allows predictions of the I-V curve as well as frequency limitations. Experiments with different sized points, varying pul...
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