射频功率放大器用GaN HEMT线性度的改进

Kazutaka Inoue, Hiroshi Yamamoto, K. Nakata, Fumio Yamada, Takashi Yamamoto, S. Sano
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引用次数: 7

摘要

线性度对于GaN hemt进入微波放大器市场变得越来越重要。本文描述了我们的0.4μm AlGaN/GaN HEMT的大信号模型的轮廓,考虑脉冲偏置24v工作。利用所构建的Angelov模型进行分析,证明了10 dB以上退行区的互调失真(IMD)是由亚阈值gm曲线决定的,即急剧上升的gm曲线降低了IMD。因此,我们提出了一种薄n-GaN层插入缓冲结构(ni-buffer),该结构在后退区实现了8 dB的显着IMD改善。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Linearity Improvement of GaN HEMT for RF Power Amplifiers
The linearity has become more important to expand GaN HEMTs into microwave amplifier markets. This paper describes the outline of the large signal model of our 0.4μm AlGaN/GaN HEMT, considering the pulse biased 24 V operation. The analysis which utilizes the constructed Angelov model proved that the intermodulation distortion (IMD) of more than 10 dB backed off region is determined by the sub-threshold gm profile, namely steep rising gm profile degrades IMD. Thus, we proposed a thin n-GaN layer inserted buffer structure (ini-buffer), which realizes the significant IMD improvement of 8 dB, in the backed-off region.
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