蚀刻GaAs/AlGaAs量子线中量子化电导的长度依赖性

L. Worschech, F. Beuscher, A. Forchel, A. Kristensen, P. Lindelof, C. B. Sørensen
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引用次数: 0

摘要

通过高分辨率电子束光刻和湿法化学刻蚀制备的强侧向约束量子线显示出电导量子化的长度可与相应2deg相关电子的平均自由程相当。通过量子化电导与能量间隔的温度依赖关系,发现135 nm宽导线的两个最低1D子带之间的/spl Delta/E/sub 1D/=12.5/spl plusmn/0.5 meV,比常用的分栅器件大约5倍。以0.05/spl次/10/sup 6/和2/spl次/10/sup 6/ cm/sup 2/Ns为迁移率的晶圆制备量子线,研究了电导量子化随线长增加的击穿。我们的结果支持Koester et al.(1996)的建议,即在强约束量子线中后向散射被抑制,其中一维子带能量间隔远远大于样品中的随机电位波动。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Length dependence of quantized conductance in etched GaAs/AlGaAs quantum wires
Quantum wires with strong lateral confinement fabricated by high resolution electron beam lithography and wet chemical etching show conductance quantization up to a length comparable to the mean free path of the electrons associated with respective 2DEGs. By the temperature dependence of the quantized conductance an energy-spacing, /spl Delta/E/sub 1D/=12.5/spl plusmn/0.5 meV, between the two lowest lying 1D subbands for 135 nm wide wires was found-about 5 times larger than in commonly used split-gate devices. The breakdown of conductance quantization with increasing wire length is studied for quantum wires fabricated from wafers with different mobilities between 0.05/spl times/10/sup 6/ and 2/spl times/10/sup 6/ cm/sup 2/Ns. Our results support the suggestion by Koester et al. (1996), that backscattering is suppressed in strongly confined quantum wires, where the 1D subband energy spacing is much larger than the random potential fluctuations in the sample.
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