美国EUV光刻技术现状及计划

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387) Pub Date : 2000-07-11 DOI:10.1109/IMNC.2000.872747

C. Gwyn

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引用次数: 0

摘要

美国主要的EUV光刻开发项目是由由Advanced Micro Devices、英特尔、美光和摩托罗拉组成的EUV LLC联盟支持的。该项目的目标是促进研究、开发和工程，使半导体设备制造商(sem)能够在2005年之前为集成电路制造提供70纳米EUV光刻工具的生产数量。

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Status of EUV lithography and plans in USA

The major EUV lithography development program in the US is supported by the EUV LLC consortium composed of Advanced Micro Devices, Intel, Micron, and Motorola. The program goal is to facilitate the research, development and engineering to enable the Semiconductor Equipment Manufacturers (SEMs) to provide production quantities of 70 nm EUV lithography tools for IC manufacturing by 2005.

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Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)

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