{"title":"纳米级弹道mosfet的仿真技术与方法","authors":"G. Iannaccone, G. Fiori, G. Curatola","doi":"10.1109/NANO.2002.1032223","DOIUrl":null,"url":null,"abstract":"In this paper, we present the methods and the techniques we use for performing the simulation of nanoscale ballistic MOSFETs in bulk silicon, silicon on insulator, and silicon-germanium. Results for typical structures with channel length of 25 nm are presented.","PeriodicalId":408575,"journal":{"name":"Proceedings of the 2nd IEEE Conference on Nanotechnology","volume":"12 7","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2002-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"Techniques and methods for the simulation of nanoscale ballistic MOSFETs\",\"authors\":\"G. Iannaccone, G. Fiori, G. Curatola\",\"doi\":\"10.1109/NANO.2002.1032223\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper, we present the methods and the techniques we use for performing the simulation of nanoscale ballistic MOSFETs in bulk silicon, silicon on insulator, and silicon-germanium. Results for typical structures with channel length of 25 nm are presented.\",\"PeriodicalId\":408575,\"journal\":{\"name\":\"Proceedings of the 2nd IEEE Conference on Nanotechnology\",\"volume\":\"12 7\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2002-11-07\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of the 2nd IEEE Conference on Nanotechnology\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/NANO.2002.1032223\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the 2nd IEEE Conference on Nanotechnology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/NANO.2002.1032223","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Techniques and methods for the simulation of nanoscale ballistic MOSFETs
In this paper, we present the methods and the techniques we use for performing the simulation of nanoscale ballistic MOSFETs in bulk silicon, silicon on insulator, and silicon-germanium. Results for typical structures with channel length of 25 nm are presented.