{"title":"如何确定正常铝键板上的氟污染水平?","authors":"H. Younan","doi":"10.1109/IPFA47161.2019.8984826","DOIUrl":null,"url":null,"abstract":"IN our previous paper, we discussed the differences between EDS and AES and concluded that EDS couldn’t be used to determine F level on A Normal Al bondpad. In this paper, we will discuss how we can determine fluorine contamination level on a normal Al bondpad and propose to use AES/XPS to analyse fluorine level on a normal Al bondpad in wafer fabrication.","PeriodicalId":169775,"journal":{"name":"2019 IEEE 26th International Symposium on Physical and Failure Analysis of Integrated Circuits (IPFA)","volume":"28 47","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"How To Determine Fluorine Contamination Level On A Normal Al Bondpad?\",\"authors\":\"H. Younan\",\"doi\":\"10.1109/IPFA47161.2019.8984826\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"IN our previous paper, we discussed the differences between EDS and AES and concluded that EDS couldn’t be used to determine F level on A Normal Al bondpad. In this paper, we will discuss how we can determine fluorine contamination level on a normal Al bondpad and propose to use AES/XPS to analyse fluorine level on a normal Al bondpad in wafer fabrication.\",\"PeriodicalId\":169775,\"journal\":{\"name\":\"2019 IEEE 26th International Symposium on Physical and Failure Analysis of Integrated Circuits (IPFA)\",\"volume\":\"28 47\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2019-07-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2019 IEEE 26th International Symposium on Physical and Failure Analysis of Integrated Circuits (IPFA)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IPFA47161.2019.8984826\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2019 IEEE 26th International Symposium on Physical and Failure Analysis of Integrated Circuits (IPFA)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IPFA47161.2019.8984826","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
摘要
在我们之前的论文中,我们讨论了EDS和AES的区别,并得出EDS不能用于测定A Normal Al键垫上的F电平的结论。本文将讨论如何确定普通铝键合板上的氟污染水平,并提出使用AES/XPS分析晶圆制造中普通铝键合板上的氟污染水平。
How To Determine Fluorine Contamination Level On A Normal Al Bondpad?
IN our previous paper, we discussed the differences between EDS and AES and concluded that EDS couldn’t be used to determine F level on A Normal Al bondpad. In this paper, we will discuss how we can determine fluorine contamination level on a normal Al bondpad and propose to use AES/XPS to analyse fluorine level on a normal Al bondpad in wafer fabrication.