提高两级光聚合物全息记录性能的高折射率单体

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Bin Guo, Mingxuan Wang, Diqin Zhang, Minyuan Sun, Yong Bi* and Yuxia Zhao*, 
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引用次数: 2

摘要

光聚合物在制备透明体全息光栅(VHG)方面具有广阔的应用前景,是许多应用领域的核心光学元件。为了提高两级光聚合物的全息记录性能,设计合成了四种高折射率(1.59 ~ 1.63)的新型(甲基)丙烯酸酯单体(CTA、CTMA、CTBA、CTBMA)。将它们作为一个书写单体,制备了一系列不同配方和厚度的光聚合物样品,用于全息记录。其中,含9 wt % CTMA的配方表现出最好的性能。利用它作为记录介质,构建了高分辨率、高衍射效率的VHG。其折射率调制达到0.046。光漂白后400 ~ 800 nm内的总透过率达到96.62%。结果表明,基于ctma的配方在开发高性能透明VHG方面具有很大的应用潜力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

High Refractive Index Monomers for Improving the Holographic Recording Performance of Two-Stage Photopolymers

High Refractive Index Monomers for Improving the Holographic Recording Performance of Two-Stage Photopolymers

Photopolymers hold great promise for the preparation of transparent volume holographic gratings (VHG), which are core optical elements in many application fields. To improve the holographic recording property of a two-stage photopolymer, four new (meth)acrylate monomers (CTA, CTMA, CTBA, CTBMA) with high refractive indices (1.59–1.63) are designed and synthesized in this study. Using them as one writing monomer, a series of photopolymer samples with different formulations and thicknesses are fabricated for holographic recording. Among them, a formulation containing 9 wt % CTMA shows the best performance. Using it as a recording medium, a VHG with high resolution and diffraction efficiency is constructed. Its refractive index modulation reaches 0.046. Moreover, its total transmittance within 400–800 nm achieves 96.62% after photobleaching. The results indicate that the CTMA-based formulation has great application potential in developing high-performance transparent VHG.

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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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