Microfabrication using focused ion beams

Abstract

“Soon all semiconductor devices could be made this way” is a claim often made for focussed ion beam technology. As the Osaka University team relate in this overview, numerous labs around the world have used FIB to dope, deposit, etch and define semiconductor, and other, films to microfabricate circuits and devices. FIB has yet to become a routine method but the techniques under this banner hold much promise for the production of next generation devices.