Cover image from I. P. Parkin and co-workers (Chem Vap. Deposition 2013, 19, 355)

Chemical Vapor Deposition Pub Date : 2013-12-11 DOI:10.1002/cvde.201371011

引用次数: 0

Abstract

Four different TiO₂ thin films are prepared using AACVD, APCVD, and combined AACVD and APCVD in order to obtain films with new morphologies. The photocatalytic properties are assessed qualitatively by Resazurin and quantitatively using tris(hydroxymethyl)aminomethane.

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封面图片来自i.p. Parkin和同事(Chem Vap)。沉积学报，2013,19,355)

采用AACVD、APCVD以及AACVD和APCVD相结合的方法制备了4种不同的TiO2薄膜，得到了具有新形貌的薄膜。光催化性能用Resazurin进行定性评价，用三(羟甲基)氨基甲烷进行定量评价。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Chemical Vapor Deposition 工程技术-材料科学：膜

自引率

0.00%

发文量

审稿时长

>12 weeks

期刊介绍： Chemical Vapor Deposition (CVD) publishes Reviews, Short Communications, and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information, and book reviews. All papers are peer-reviewed. The journal provides a unified forum for chemists, physicists, and engineers whose publications on chemical vapor deposition have in the past been spread over journals covering inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films, and ceramic processing.