Development of a stable non-cyanide gold-tin electroplating solution for optoelectronic applications

F. Huang, Yawei Liu, Mingliang L. Huang
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引用次数: 1

Abstract

A highly stable non-cyanide electroplating bath which can maintain clear at least one month was developed based on Au(III)-Sn(II) using 5,5-dimetheyl-hydantoin (DMH) and pyrophosphate as complexes. The combination of DMH and pyrophosphate can effectively minimize the difference of the deposition potentials between Au and Sn, making the codeposition of Au-Sn alloys possible. The cyclic voltammetry (CV) curve revealed that the codeposition of Au and Sn occurred at the potential of -790mV with a peak potential of -900mV. Pulsed plating was employed to optimize the morphology and composition of Au-Sn alloy films. The effects of pulse frequency, duty percentage and peak current density on the morphology and composition of the deposits were investigated. The compact Au-Sn eutectic alloy with Sn content controlled from 10 at.% to 50 at.% can be obtained. The Au-Sn deposits were characterized by the scanning electron microscopic (SEM) and energy-dispersive spectroscopic (EDS) analyses.
光电用稳定无氰金-锡电镀溶液的研制
以金(III)-锡(II)为基料,以5,5-二甲基氢脲(DMH)和焦磷酸盐为配合物,研制了一种高稳定的无氰电镀液,可保持清洁至少一个月。DMH和焦磷酸盐的结合可以有效地减小Au和Sn的沉积电位差异,使Au-Sn合金的共沉积成为可能。循环伏安(CV)曲线显示,Au和Sn的共沉积发生在-790mV电位下,峰值电位为-900mV。采用脉冲镀的方法优化了金-锡合金薄膜的形貌和组成。研究了脉冲频率、占空比和峰值电流密度对镀层形貌和成分的影响。致密的金-锡共晶合金,锡含量控制在10at以内。%到50%。%可以得到。利用扫描电镜(SEM)和能谱分析(EDS)对金矿床进行了表征。
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