Local Variation-Aware Transistor Design through Comprehensive Analysis of Various Vdd/Temperatures Using Sub- 7nm Advanced FinFET Technology

Abstract

In this paper, key contributors to local variability of sub-7nm FinFET has been identified in various operating environments. Through a comprehensive analysis, different root-cause for high and low temperature region have been revealed and confirmed by advanced Si wafer for the first time. Moreover, a local variation-aware transistor was successfully demonstrated to reduce $\sigma V_{\mathrm{min}}$ distribution by 0.5 x and 0.3 x at cold temperature.