C. Tsai, T. Ku, M.F. Chen, W. Chiou, C. Wang, Douglas C. H. Yu
{"title":"Low Temperature SoIC™ Bonding and Stacking Technology for 12/16-Hi High Bandwidth Memory (HBM)","authors":"C. Tsai, T. Ku, M.F. Chen, W. Chiou, C. Wang, Douglas C. H. Yu","doi":"10.1109/VLSITechnology18217.2020.9265044","DOIUrl":null,"url":null,"abstract":"A 12-high (12-Hi) die stack using low temperature SoIC bonding and stacking technology is presented and demonstrated for the application of HBM. The daisy chains in the 12-Hi structure incorporating over ten thousand TSVs and bonds are tested. Liner I-V curves are obtained to demonstrate the good bonding and stacking quality. The electrical link from a base logic die to top DRAM is built up to study the bandwidth and power consumption. Compared to $\\mu \\mathrm{bump}$ technology, the bandwidth for 12-Hi and 16-Hi structure using the SoIC technology shows the improvement of 18% and 20%, respectively and the power efficiency demonstrates the improvement of 8% and 15%, respectively. Also, the thermal performance for the 12-Hi and 16-Hi SoIC-bond structures are improved by 7% and 8%, respectively. Based on the proposed technologies, the scalability of bond pitch to sub-ten $\\mu\\mathrm{m}$ and die thickness to be thinner is prospected.","PeriodicalId":6850,"journal":{"name":"2020 IEEE Symposium on VLSI Technology","volume":"10 1","pages":"1-2"},"PeriodicalIF":0.0000,"publicationDate":"2020-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 IEEE Symposium on VLSI Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSITechnology18217.2020.9265044","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
A 12-high (12-Hi) die stack using low temperature SoIC bonding and stacking technology is presented and demonstrated for the application of HBM. The daisy chains in the 12-Hi structure incorporating over ten thousand TSVs and bonds are tested. Liner I-V curves are obtained to demonstrate the good bonding and stacking quality. The electrical link from a base logic die to top DRAM is built up to study the bandwidth and power consumption. Compared to $\mu \mathrm{bump}$ technology, the bandwidth for 12-Hi and 16-Hi structure using the SoIC technology shows the improvement of 18% and 20%, respectively and the power efficiency demonstrates the improvement of 8% and 15%, respectively. Also, the thermal performance for the 12-Hi and 16-Hi SoIC-bond structures are improved by 7% and 8%, respectively. Based on the proposed technologies, the scalability of bond pitch to sub-ten $\mu\mathrm{m}$ and die thickness to be thinner is prospected.