Physical basis and characteristics of light emission from quantized planar Ge structures

R. Venkatasubramanian, D. Malta, M. Timmons, J. Hutchby
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引用次数: 1

Abstract

The characteristics of luminescence from quantized planar Ge structures are presented, showing stability with time, dependence on laser power excitation and temperature, and the presence of GaAs-Al/sub 0.8/Ga/sub 0.2/As overlayers. A single broad emission at 1.7 eV near 300 K is observed to become four distinct emissions at 2.16 eV, 2.01 eV, 1.696 eV, and 1.56 eV at 77 K. A model describing the basis of luminescence in small Ge structures is also presented. The increased probability for radiative recombination in the quantized structures is a result of states in the conduction band and valence band being closed in k-space than in bulk Ge. Thus, the luminescence at 1.7 eV in the quantized structures probably results from a one or two phonon-assisted process compared to a 4-5 phonon process in bulk Ge for photoluminescence at 0.7 eV.<>
量子化平面锗结构光发射的物理基础和特性
量子化平面Ge结构的发光特性随时间稳定,与激光功率激发和温度有关,存在GaAs-Al/sub 0.8/Ga/sub 0.2/As覆盖层。在300 K附近,一个1.7 eV的单一宽发射被观测到在77 K时变成了2.16 eV、2.01 eV、1.696 eV和1.56 eV的四个不同的发射。还提出了一个描述小锗结构发光基础的模型。量子化结构中辐射复合的可能性增加是由于k空间中导带和价带的状态比体锗中的状态关闭。因此,在量子化结构中,1.7 eV的发光可能是由一个或两个声子辅助过程产生的,而在体锗中,0.7 eV的光致发光则是由4-5个声子辅助过程产生的
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